Articles In Academic Journals

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Year	Title
2008	Experimental Study of ALD HfO2 Deposited on Strained Silicon-on-Insulator and Standard SOI.  J. Electrochem. Soc.. G129-G133.
2007	Experimental Study of Atomic Layer Deposition (ALD) HfO2 Deposited on Strained Silicon-on-Insulator (sSOI) & extra strained (xsSOI) and SOI.  ECS Transactions. 421-429.